Cyclophosphazene-containing polymers as imprint lithography resists

Journal of Inorganic and Organometallic Polymers and Materials

Volumn 17, Issue 2, 2007, Pages 377-385

  Hagberg, Erik C ^a   Hart, Mark W ^a   Cong, Lianhui ^b   Allen, Christopher W ^b   Carter, Kenneth R ^c  

^a IBM ALMADEN RESEARCH CENTER   (United States)

^b UNIVERSITY OF VERMONT   (United States)

^c UNIVERSITY OF MASSACHUSETTS   (United States)

Author keywords

Cyclophosphazenes; Imprint lithography; Photoresist; Polymer

Indexed keywords

EID: 34248202287     PISSN: 15741443     EISSN: 15741451     Source Type: Journal    
DOI: 10.1007/s10904-007-9130-7     Document Type: Article

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