Design and measurement of nanopatterns for FIB reliability assessments

Microelectronic Engineering

Volumn 84, Issue 5-8, 2007, Pages 818-821

  Kang, Hyun Wook ^a   Cho, Dong Woo ^a  

^a Pohang University of Science and Technology (POSTECH)   (South Korea)

Author keywords

Focused ion beam; Nanopatterns; Reliability assessment

Indexed keywords

ASPECT RATIO; FOCUSED ION BEAMS; RELIABILITY ANALYSIS; SCANNING ELECTRON MICROSCOPY; THREE DIMENSIONAL;

FOCUSED ION BEAM (FIB); NANOSCALE MACHINING; RELIABILITY ASSESSMENT;

NANOSTRUCTURED MATERIALS;

EID: 34247634114     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.01.029     Document Type: Article

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