Focused ion beam nanolithography on AIF3 at a 10 nm scale

Applied Physics Letters

Volumn 70, Issue 15, 1997, Pages 2049-2051

  Gierak, J ^a   Vieu, C ^a   Launois, H ^a   Ben Assayag, G ^a,b   Septier, A ^a,c  

^a CNRS   (France)

^b CEMES CNRS   (France)

^c Sorbonne Paris Nord University   (France)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001457946     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.118810     Document Type: Article

References (10)

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