Focused ion beam micromachining of TiNi film on Si(1 1 1)

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 211, Issue 3, 2003, Pages 363-368

  Xie, D Z ^a   Ngoi, B K A ^a   Ong, A S ^a   Fu, Y Q ^a   Lim, B H ^a  

^a NANYANG TECHNOLOGICAL UNIVERSITY   (Singapore)

Author keywords

Focused ion beam; Micromachining; Shape memory alloy; Sputtering

Indexed keywords

ATOMIC FORCE MICROSCOPY; ION BEAMS; MAGNETRON SPUTTERING; MICROACTUATORS; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; SHAPE MEMORY EFFECT; SILICON WAFERS; SURFACE ROUGHNESS; TITANIUM NITRIDE;

ION BEAM CURRENTS;

THIN FILMS;

EID: 0141894343     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(03)01412-5     Document Type: Article

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