Production of high density and low electron-temperature plasma by a modified grid-biasing method using inductively coupled RF discharge

Thin Solid Films

Volumn 457, Issue 1, 2004, Pages 55-58

  Ikada, Reijiro ^a   Nishimura, Gouki ^a   Kato, Kohgi ^b   Iizuka, Satoru ^a  

^a TOHOKU UNIVERSITY   (Japan)

^b Department of Electric Engineering   (Japan)

Author keywords

Electron temperature; Gamma effect; Grid bias method; Inductively coupled plasma

Indexed keywords

CARRIER CONCENTRATION; DISSOCIATION; ELECTRIC POTENTIAL; ELECTRON BEAMS; INDUCTIVELY COUPLED PLASMA; IONIZATION; NUCLEATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

ELECTRON BEAM DISCHARGES; ELECTRON TEMPERATURE; GAMMA EFFECTS; GRID BIAS METHOD;

PLASMA SOURCES;

EID: 2342596441     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2003.12.013     Document Type: Conference Paper

References (8)

1. N. Sato, S. Iizuka in: Proceedings of the International Seminar on Reactive Plasmas, Nagoya, Japan, 1991, p. 371.
2. Gicquel A., Hassouni K., Silva F., Achard J. Curr. Appl. Phys. 1:2001;479.
3. Goodwin D.G. J. Appl. Phys. 74:1993;6895.
4. Wild C., Koidl P., M-Sebert W., Walcher H., Kohl R., Herres N., Locher R., Samlenski R., Brenn R. Diamond Relat. Mater. 2:1993;158.
5. Kato K., Shimizu T., Iizuka S., Sato N. Appl. Phys. Lett. 76:2000;547.
6. Kato K., Iizuka S., Sato N. Appl. Phys. Lett. 65:1994;816.
7. S. Iizuka, N. Sato, Electr. Eng. Jpn., 130 (200) 1.
8. Shimizu T., Iizuka S., Kato K., Sato N. Plasma Sources Sci. Technol. 12:2003;521.