High resolution variable-shaped beam direct write

Microelectronic Engineering

Volumn 84, Issue 5-8, 2007, Pages 774-778

  Hahmann, Peter ^a   Bettin, Lutz ^a   Boettcher, Monika ^a   Denker, Ulrich ^a   Elster, Thomas ^a   Jahr, Steffen ^a   Kirschstein, Ulf Carsten ^a   Kliem, Karl Heinz ^a   Schnabel, Bernd ^a  

^a Vistec Electron Beam GmbH   (Germany)

Author keywords

Electron beam direct write (EBDW); Knife edge method; Resolution

Indexed keywords

COMPUTER SIMULATION; COULOMB INTERACTIONS; GAUSSIAN BEAMS; OPTICAL INSTRUMENT LENSES; OPTICAL RESOLVING POWER; SEMICONDUCTOR MATERIALS;

ELECTRON BEAM DIRECT WRITE (EBDW); KNIFE EDGE METHOD; VARIABLE SHAPED BEAM (VSB;

ELECTRON BEAMS;

EID: 34247617318     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.01.049     Document Type: Article

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