Looking into the crystal ball: Future device learning using hybrid E-beam and optical lithography

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5751, Issue I, 2005, Pages 26-34

  Steen, S E ^a   McNab, S J ^a   Sekaric, L ^a   Babich, I ^a   Patel, J ^a   Bucchignano, J ^a   Rooks, M ^a   Fried, D M ^a   Topol, A W ^a   Brancaccio, J R ^a   Yu, R ^a   Hergenrother, J M ^a   Doyle, J P ^a   Nunes, R ^a   Viswanathan, R G ^a   Purushothaman, S ^a   Rothwell, M B ^a  

^a IBM RESEARCH   (United States)

Author keywords

BEOL; Device integration; DUV; Electron beam; Hybrid lithography; SRAM

Indexed keywords

BEOL; DEVICE INTEGRATION; DUV; ELECTRON-BEAM; HYBRID-LITHOGRAPHY;

ELECTRON BEAMS; FREIGHT TRANSPORTATION; PHOTOLITHOGRAPHY; PROCESS CONTROL; SEMICONDUCTOR MATERIALS; STATIC RANDOM ACCESS STORAGE;

LEARNING SYSTEMS;

EID: 24644477466     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.600925     Document Type: Conference Paper

References (11)

1. D.M. Fried et.al., IEDM Proceedings (2004), pp. 261-264
2. J. Potosky et.al., J.Vac. Sci. Technol. 19(4) (1981), pp. 924-926
3. M.G. Rosenfield et.al., J.Vac. Sci. Technol. B 11(6) (1993), pp. 2615-2620
4. L.Pain et.al., Proc SPIE 5374 (2004), pp. 590-600
5. S. Tedesco et.al., J.Vac. Sci. Technol. B 16(6) (1998), pp. 3676-3683
6. S. Landis et.al., Jpn. J. Appl. Phys. 43(6B) (2004), pp. 3974-3980
7. L. Pain et.al., Proc. SPIE Vol. 3999 (2000), pp. 706-716
8. F. Benistant et.al., J. Vac. Sci. Technol. B 14 (1996), pp. 4051-4054
9. G. M. Wallraff et.al., J. Vac. Sci. Technol. B 22(6), Nov/Dec 2004, pp. 3479-3484
10. D.R. Medeiros et.al., Proc. SPIE Vol 4345 (2001), pp. 241-250
11. Y. Laplance et.al., Proc. SPIE 5037 (2003), pp. 572-582