Shaped E-beam lithography integration work for advanced ASIC manufacturing progress report

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4688, Issue 2, 2002, Pages 607-618

  Pain, L ^a   Charpin, M ^a   Laplanche, Y ^a,b   Henry, D ^a,b  

^a CEA LETI   (France)

^b STMICROELECTRONICS   (France)

Author keywords

E Beam; Lithography; Photoresist

Indexed keywords

INTEGRATED CIRCUIT MANUFACTURE; MASKS; OPTICAL RESOLVING POWER; PHOTORESISTS;

ELECTRON BEAM TOOLS;

ELECTRON BEAM LITHOGRAPHY;

EID: 0036381387     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.472335     Document Type: Article

References (5)

1. K. Suzuki, Proc. SPIE, Vol. 4343, 80-94, (2001)
2. L. Pain et al, Proc. of the Microlithography Symposium INTERFACE 2001, paper 18, 2001
3. G. Dao, "Lithography overview and 2001 budget status", Lithography SEMATECH, June 2001
4. M. Charpin et al, SPIE, Vol 4690, (2002) to be published
5. L. Pain et al, J. Vac. Sci. Technol. B 18(6), 3388-3395, Nov/Dec 2000