Changes in surface topography of amorphous silicon germanium films after light soaking

Journal of Applied Physics

Volumn 101, Issue 8, 2007, Pages

  Agarwal, Pratima ^a   Srivastava, Alok ^b,d   Deva, Dinesh ^c  

^a INDIAN INSTITUTE OF TECHNOLOGY GUWAHATI   (India)

^b TATA INSTITUTE OF FUNDAMENTAL RESEARCH   (India)

^c INDIAN INSTITUTE OF TECHNOLOGY KANPUR   (India)

^d LUND INSTITUTE OF TECHNOLOGY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; GERMANIUM; MEASUREMENT THEORY; STRUCTURAL PROPERTIES; SURFACE ROUGHNESS; SURFACE TOPOGRAPHY; THIN FILMS;

GERMANIUM FILMS; LIGHT SOAKING;

AMORPHOUS SILICON;

EID: 34247596035     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2721944     Document Type: Conference Paper

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