Composition dependence of surface morphology of ultrathin a-SiGe:H alloys studying by atomic force microscopy

Thin Solid Films

Volumn 335, Issue 1-2, 1998, Pages 130-133

  Xu, Jun ^a   Chen, Kunji ^a   Feng, Duan ^a   Miyazaki, Seiichi ^b   Hirose, Masataka ^b  

^a NANJING UNIVERSITY   (China)

^b HIROSHIMA UNIVERSITY   (Japan)

Author keywords

Hydrogen annealing; Photoelectric property; SiGe alloys; Surface morphology

Indexed keywords

AMORPHOUS ALLOYS; ANNEALING; ATOMIC FORCE MICROSCOPY; COMPOSITION EFFECTS; DEPOSITION; FILM GROWTH; HYDROGENATION; MORPHOLOGY; PHOTOELECTRICITY; SILICON ALLOYS;

HYDROGEN PLASMA ANNEALING; SILICON GERMANIUM ALLOYS;

ULTRATHIN FILMS;

EID: 0346307957     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(98)00817-7     Document Type: Article

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