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Volumn 84, Issue 5-8, 2007, Pages 1412-1415

Overlay as the key to drive wafer scale 3D integration

Author keywords

3D integration; 3DIC; Alignment; Oxide fusion bonding; Wafer bonding

Indexed keywords

FILM GROWTH; INTEGRATED CIRCUITS; LITHOGRAPHY; SILICON; THREE DIMENSIONAL; WAFER BONDING;

EID: 34247570463     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.01.231     Document Type: Article
Times cited : (23)

References (15)
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  • 5
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    • Patti R. Proc. IEEE 94 6 (2006) 1214-1224
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  • 6
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    • A. Rahman, R. Reif, Thermal analysis of three-dimensional (3D) integrated circuits (ICs), in: Proceedings of the IEEE International Interconnect Conference, 2001, pp. 157-159.
  • 7
    • 0031334355 scopus 로고    scopus 로고
    • H. Kurino, et al., Three-dimensional integration technology for real time micro-vision system, in: Proceedings of the International Conference on Innovative Systems in Silicon, 1997, pp. 203-212.
  • 8
    • 0025591293 scopus 로고    scopus 로고
    • Y. Hayashi, et al., Fabrication of three-dimensional IC using "Cumulatively Bonded IC" (CUBIC) technology, in: Proceedings Symposium on VLSI Technology, 1990, p. 95.
  • 11
    • 84877080692 scopus 로고    scopus 로고
    • D. La Tulipe, et al., Critical aspects of layer transfer and alignment tolerances for 3D integration processes, in: Proceedings of the International Conference and Exhibition on Device Packaging (IMAPS), J. Microelectron. Electron. Pkg. (2006).
  • 12
    • 34247640561 scopus 로고    scopus 로고
    • R.J. Gutmann, in: Digest Topical Mtg. Silicon Monolithic Integrated Circuits in RF Systems, 2004, pp. 45-45.
  • 13
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    • J.D. Armitage, J.P. Kirk, Analysis of overlay distortion patterns, in: Integrated Circuit Metrology, Inspection and Process Control II Proceedings, SPIE 921 (1988).
  • 14
    • 0034822514 scopus 로고    scopus 로고
    • T. Suga, et al., A new wafer-bonder of ultra-high precision using surface activated bonding (SAB) concept, in: Proceedings of the 51st Electronic Components and Technology Conference, 2001, pp. 1013-1018.
  • 15
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    • K. Warner, et al., An investigation of wafer-to-wafer alignment tolerances for three-dimensional integrated circuit fabrication, in: Proceedings of the International SOI Conference, 2004, p. 71.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.