Comment on 'effects of hydrogen dilution on deposition process of nano-crystalline silicon film by SiCl4/H2 plasma'

Journal of Physics D: Applied Physics

Volumn 40, Issue 9, 2007, Pages 2994-2995

  Tanarro, Isabel ^a  

^a INSTITUTO DE ESTRUCTURA DE LA MATERIA   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

DENSITY (OPTICAL); DILUTION; NANOCRYSTALLINE SILICON; SILICON COMPOUNDS;

DILUTION RATIO; HYDROGEN DILUTION; RADICAL CONCENTRATIONS;

PLASMAS;

EID: 34247524182     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/40/9/N01     Document Type: Review

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