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Volumn 17, Issue 5, 2007, Pages 923-930

Exploiting differential etch rates to fabricate large-scale nozzle arrays with protudent geometry

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; GEOMETRY; NANOTECHNOLOGY; SCANNING; SILICON NITRIDE;

EID: 34247510625     PISSN: 09601317     EISSN: 13616439     Source Type: Journal    
DOI: 10.1088/0960-1317/17/5/011     Document Type: Article
Times cited : (6)

References (21)
  • 2
    • 34247528161 scopus 로고    scopus 로고
    • http://arrayit.com/Products/Printing/
  • 19
    • 34247500283 scopus 로고    scopus 로고
    • www.latech.edu/tech/engr/bme/gale_classes/biomems/dry%20etching.pdf


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.