Fabrication of a nanosize metal aperture for a near field scanning optical microscopy sensor using photoresist removal and sputtering techniques

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 4 I, 2000, Pages 1333-1337

  Jung, M Y ^a   Lyo, I W ^a   Kim, D W ^b   Choi, S S ^b  

^a Yonsei University   (South Korea)

^b SunMoon University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; EVAPORATION; MASERS; METALLIC FILMS; MICROMACHINING; OPTICAL MICROSCOPY; PHOTORESISTS; REACTIVE ION ETCHING; SEMICONDUCTOR DEVICE MANUFACTURE; SILICA; SILICON NITRIDE; THIN FILMS;

ELECTRON BEAM EVAPORATION; LOW-PRESSURE CHEMICAL VAPOR DEPOSITION; NEAR FIELD SCANNING OPTICAL MICROSCOPY (NSOM);

OPTICAL SENSORS;

EID: 0034229038     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582350     Document Type: Article

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