Frequency dependence of photoresist ashing with dielectric barrier discharges in oxygen

Journal of Applied Physics

Volumn 83, Issue 10, 1998, Pages 5095-5101

  Falkenstein, Zoran ^a  

^a LOS ALAMOS NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001244393     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.367402     Document Type: Article

References (36)

1. M. Zeuner, J. Meichsner, and H.-U. Poll, Plasma Sources Sci. Technol. 4, 406 (1995).
2. E. J. H. Collart, J. A. G. Baggerman, and R. J. Visser, J. Appl. Phys. 78, 47 (1995).
3. J. Robertson, Pure Appl. Chem. 66, 1789 (1994).
4. J. L. Vossen and W. Kern, Thin Film Processes II (Academic, New York, 1991).
5. D. B. Graves, IEEE Trans. Plasma Sci. 22, 31 (1994).
6. M. D. Koretsky and J. A. Reimer, J. Appl. Phys. 72, 5081 (1992).
7. T. J. Sommerer and M. J. Kushner, J. Appl. Phys. 71, 1654 (1992).
8. D. J. Rej and R. B. Alexander, J. Vac. Sci. Technol. B 12, 2380 (1994).
9. R. Peyrous, P. Pignolet, and B. Held, J. Phys. D 22, 1658 (1989).
10. B. Eliasson and U. Kogelschatz, J. Phys. B 19, 1241 (1986).
11. B. Eliasson and U. Kogelschatz, IEEE Trans. Plasma Sci. 19, 309 (1991).
12. B. Eliasson and U. Kogelschatz, IEEE Trans. Plasma Sci. 19, 1063 (1991).
13. B. Eliasson, M. Hirth, and U. Kogelschatz, J. Phys. D 20, 1421 (1987).
14. D. Evans, L. A. Rosocha, G. K. Anderson, J. J. Coogan, and M. J. Kushner, J. Appl. Phys. 74, 5378 (1993).
15. L. A. Rosocha, in Plasma Science and the Environment, edited by W. Manheimer, L. E. Sugiyama, and T. H. Stix (American Institute of Physics, Woodbury, NY, 1997).
16. Z. Falkenstein, J. Adv. Oxid. Technol. 2, 223 (1997).
17. B. Gellert and U. Kogelschatz, Appl. Phys. B: Photophys. Laser Chem. 52, 14 (1991).
18. Z. Falkenstein and J. J. Coogan, J. Phys. D 30, 2704 (1997).
19. R. Schwarz and J. G. H. Salge, in Proceedings of the 11th International Symposium on Plasma Chemistry, edited by J. Harry (Loughborough, Leicestershire, England, 1993).
20. Z. Falkenstein and J. J. Coogan, J. Appl. Phys. 82, 6273 (1997).
21. Z. Falkenstein and J. J. Coogan, J. Phys. D 30, 817 (1997).
22. S. Ma and J. P. McVittie, J. Vac. Sci. Technol. B 14, 566 (1996).
23. S. Ma, J. P. McVittie, and K. C. Saraswat, IEEE Electron Device Lett. 16, 534 (1995).
24. S. Fang and J. P. McVittie, Trans. El. Dev. 41, 1034 (1994).
25. V. Schorpp, dissertation, University of Karlsruhe, Germany, 1991.
26. Z. Falkenstein, J. Appl. Phys. 81, 7158 (1997).
27. K. Stockwald and M. Neiger, Contr. Plasma Phys. 35, 15 (1995).
28. M. Pons, J. Pelletier, O. Joubert, and P. Paniez, Jpn. J. Appl. Phys., Part 1 34, 3723 (1995).
29. O. Joubert, P. Paniez, J. Pelletier, and M. Pons, Appl. Phys. Lett. 59, 959 (1991).
30. M. Pons, O. Joubert, P. Paniez, and J. Pelletier, J. Appl. Phys. 70, 2376 (1991).
31. G. N. Taylor and T. M. Wolf, Polym. Eng. Sci. 20, 1087 (1980).
32. M. A. Hartney, D. W. Hess, and D. S. Soane, J. Vac. Sci. Technol. B 7, 1 (1989).
33. M. D. Koretsky and J. A. Remer, J. Appl. Phys. 72, 5081 (1991).
34. J. Pelletier, Y. Arnal, and O. Joubert, Appl. Phys. Lett. 53, 1914 (1988).
35. O. Joubert and M. Pons, J. Vac. Sci. Technol. B 11, 26 (1993).
36. G. W. Morey, The Properties of Glass (Reinhold, New York, 1954).