Visualization of a dual-frequency plasma etch process

Measurement Science and Technology

Volumn 18, Issue 3, 2007, Pages 645-649

  Law, V J ^a   MacGearailt, N ^a  

^a DUBLIN CITY UNIVERSITY   (Ireland)

Author keywords

Fault detection; Plasma process diagnostics; Radio frequency analysis

Indexed keywords

DECISION MAKING; FAULT DETECTION; GAMMA RAYS; PRINCIPAL COMPONENT ANALYSIS;

PLASMA PROCESS DIAGNOSTICS; RADIO FREQUENCY ANALYSIS;

PLASMA ETCHING;

DECISION MAKING; FAULT DETECTION; GAMMA RAYS; PLASMA ETCHING; PRINCIPAL COMPONENT ANALYSIS;

EID: 34247233988     PISSN: 09570233     EISSN: 13616501     Source Type: Journal    
DOI: 10.1088/0957-0233/18/3/014     Document Type: Article

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