Frequency domain reflectometry of Hitachi ECR plasma-tool

Electronics Letters

Volumn 42, Issue 1, 2006, Pages 57-58

  Law, V J ^a   MacGearailt, N ^b  

^a DUBLIN CITY UNIVERSITY   (Ireland)

^b Intel Ireland Ltd   (Ireland)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRODES; FREQUENCIES; PLASMAS; REFLECTOMETERS;

FREQUENCY DOMAIN; TRANSMISSION-LINES; WAFER ELECTRODE;

ELECTRON CYCLOTRON RESONANCE;

EID: 30344466637     PISSN: 00135194     EISSN: None     Source Type: Journal    
DOI: 10.1049/el:20063219     Document Type: Article

References (3)

1. Law, V.J., Kenyon, A.J., Thornhill, N.F., Seeds, A., and Batty, I.: ' RF probe technology for the next generation of technological plasmas ', J. Phys. D, Appl. Phys., 2001, 34, (18), p. 2726
2. Law, V.J., Kenyon, A.J., Thornhill, N.F., Pagliarani, A., Lea, L., and Watkins, M.: ' A frequency domain measurement diagnostic technique for plasma-tool ', Meas. Sci. Technol., 2004, 15, p. 231
3. Dunwoodie, D.E., and Lacy, P.: ' Why tolerate unnecessary measurement errors ', Wiltron Technical Review 1, 1975)