Photopatterning of gold and copper surfaces by using self-assembled monolayers

Current Applied Physics

Volumn 7, Issue 5, 2007, Pages 522-527

  Choi, Hwa Sup ^a,b   Kang, Yongku ^a   Lee, Haiwon ^b   Lee, Changjin ^a  

^a Korea Research Institute of Chemical Technology   (South Korea)

^b Hanyang University   (South Korea)

Author keywords

Copper; Gold; Photolithography; Self assembled monolayer

Indexed keywords

COPPER; ETCHING; GOLD; MICROELECTRONICS; PHOTOLITHOGRAPHY; PHOTOOXIDATION; SELF ASSEMBLED MONOLAYERS; ULTRAVIOLET RADIATION;

11-MERCAPTOUNDECANOIC ACID (MUA); DODECANETHIOL (DDT); MAXIMUM RESOLUTION; MICROCONTACT PRINTING; PHOTOPATTERNING;

SURFACES;

EID: 34247139193     PISSN: 15671739     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.cap.2006.10.014     Document Type: Article

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