IR laser-induced co-decomposition of dimethyl selenide and trisilane: Gas-phase formation of SiSe and chemical vapor deposition of nanostructured H/Si/Se/C polymers

Journal of Photochemistry and Photobiology A: Chemistry

Volumn 188, Issue 2-3, 2007, Pages 399-408

  Santos, Magna ^a   Díaz, Luis ^a   Urbanová, Markéta ^b   Bastl, Zdeněk ^c   Šubrt, Jan ^d   Pola, Josef ^b  

^a INSTITUTO DE ESTRUCTURA DE LA MATERIA   (Spain)

^b INSTITUTE OF CHEMICAL PROCESS FUNDAMENTALS   (Czech Republic)

^c J HEYROVSKÝ INSTITUTE OF PHYSICAL CHEMISTRY   (Czech Republic)

^d INSTITUTE OF INORGANIC CHEMISTRY   (Czech Republic)

Author keywords

Dimethyl selenide; Laser decomposition; Laser induced fluorescence; Selenium; Silicone based films; Trisilane

Indexed keywords

EID: 34247122705     PISSN: 10106030     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jphotochem.2007.01.001     Document Type: Article

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