IR laser-induced process for chemical vapor deposition of polyselenocarbosilane films

Journal of Analytical and Applied Pyrolysis

Volumn 76, Issue 1-2, 2006, Pages 178-185

  Santos, Magna ^a   Díaz, Luis ^a   Urbanová, Markéta ^b   Pokorná, Dana ^b   Bastl, Zdeněk ^c   Šubrt, Jan ^d   Pola, Josef ^b  

^a INSTITUTO DE ESTRUCTURA DE LA MATERIA   (Spain)

^b INSTITUTE OF CHEMICAL PROCESS FUNDAMENTALS   (Czech Republic)

^c J HEYROVSKÝ INSTITUTE OF PHYSICAL CHEMISTRY   (Czech Republic)

^d INSTITUTE OF INORGANIC CHEMISTRY   (Czech Republic)

Author keywords

1,3 Disilacyclobutane; Dimethyl selenide; Laser decomposition; Polyselenocarbosilane films; Selenium

Indexed keywords

CHEMICAL VAPOR DEPOSITION; INFRARED RADIATION; LASER APPLICATIONS; POLYMERIZATION; SELENIUM;

1,3-DISILACYCLOBUTANE; DIMETHYL SELENIDE; LASER DECOMPOSITION; POLYSELENOCARBOSILANE FILMS;

POLYMER BLENDS;

EID: 32544438155     PISSN: 01652370     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jaap.2005.10.007     Document Type: Article

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