Atmospheric pressure chemical vapour deposition of vanadium diselenide thin films

Applied Surface Science

Volumn 253, Issue 14, 2007, Pages 6041-6046

  Boscher, Nicolas D ^a   Blackman, Christopher S ^a   Carmalt, Claire J ^a   Parkin, Ivan P ^a   Prieto, A Garcia ^a  

^a UNIVERSITY COLLEGE LONDON   (United Kingdom)

Author keywords

Chemical vapour deposition; Thin films; Vanadium diselenide

Indexed keywords

ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; ENERGY DISPERSIVE SPECTROSCOPY; GLASS; REACTION KINETICS; VANADIUM COMPOUNDS;

ATMOSPHERIC PRESSURE CHEMICAL VAPOUR DEPOSITION (APCVD); DEPOSITION TEMPERATURE; GLASS SUBSTRATES; VANADIUM DISELENIDE;

THIN FILMS;

EID: 34247108621     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.01.002     Document Type: Article

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