Fabrication of low-loss thin film microstrip line on low-resistivity silicon for RF applications

Microelectronics Journal

Volumn 38, Issue 3, 2007, Pages 304-309

  Wu, Hung Wei ^a   Su, Yan Kuin ^a   Yang, Ru Yuan ^a   Weng, Min Hang ^b   Lin, Yu Der ^b  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

^b NATIONAL NANO DEVICE LABORATORIES   (Taiwan)

Author keywords

ICP; Low K; Polyimide; Silicon; Thin film microstrip line (TFML)

Indexed keywords

DIELECTRIC MATERIALS; ELECTRIC CONDUCTIVITY; INDUCTIVELY COUPLED PLASMA; INTEGRATED CIRCUITS; MICROFABRICATION; SPUTTERING; THIN FILMS;

DIELECTRIC POLYIMIDES; LOW-RESISTIVITY SILICON (LRS); RADIO FREQUENCY INTEGRATED CIRCUITS (RFIC); THIN FILM MICROSTRIP LINE (TFML);

MICROSTRIP LINES;

EID: 34147181507     PISSN: 00262692     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mejo.2007.01.008     Document Type: Article

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