Characteristics of low K thin film microstrip line on standard lossy silicon substrate for radio frequency integrated circuits

Microwave and Optical Technology Letters

Volumn 49, Issue 1, 2007, Pages 79-83

  Wu, Hung Wei ^a   Weng, Min Hang ^b   Su, Yan Kuin ^a   Yang, Ru Yuan ^b  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

^b NATIONAL NANO DEVICE LABORATORIES   (Taiwan)

Author keywords

Dielectric film; Microstrip line; Microwave measurement; Polyimide

Indexed keywords

DIELECTRIC FILMS; INTEGRATED CIRCUITS; MICROWAVE MEASUREMENT; POLYIMIDES; SILICON; SPUTTERING; SUBSTRATES; THIN FILMS;

LOSSY SILICON SUBSTRATE; ON-WAFER-PROCEDURE; THIN FILM MICROSTRIP LINE (TFML);

MICROSTRIP LINES;

EID: 33846011894     PISSN: 08952477     EISSN: None     Source Type: Journal    
DOI: 10.1002/mop.22042     Document Type: Article

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