Effect of air annealing on opto-electrical properties of amorphous tin oxide films

Journal of Physics D: Applied Physics

Volumn 36, Issue 5, 2003, Pages 552-558

  Alterkop, B ^a   Parkansky, N ^a   Goldsmith, S ^a   Boxman, R L ^a  

^a TEL AVIV UNIVERSITY   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; ELECTRIC CONDUCTIVITY OF SOLIDS; GLASS; LIGHT TRANSMISSION; MORPHOLOGY; PRESSURE; THERMAL EFFECTS; TIN COMPOUNDS; VACUUM APPLICATIONS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS TIN OXIDE FILM; OPTO-ELECTRICAL PROPERTY; VACUUM ARC;

AMORPHOUS FILMS;

EID: 0037423922     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/36/5/320     Document Type: Article

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