Experimental analysis for low-temperature poly-Si films produced by using the excimer laser annealing method

Materials Science Forum

Volumn 505-507, Issue PART 1, 2006, Pages 277-282

  Chen, Yu Ru ^a   Chao, Long Sun ^a  

^a NATIONAL CHENG KUNG UNIVERSITY   (Taiwan)

Author keywords

Annealing; Excimer laser; Poly silicon; Re crystallized; Silica

Indexed keywords

ANNEALING; COOLING; EXCIMER LASERS; GRAIN SIZE AND SHAPE; LOW TEMPERATURE EFFECTS; NUCLEATION; SCANNING ELECTRON MICROSCOPY; WAVELENGTH;

CONTROL PARAMETERS; EXCIMER LASER ANNEALING METHODS; HEAT ISOLATED ZONE; POLY-SI FILMS;

POLYSILICON;

EID: 33847760487     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/0-87849-990-3.277     Document Type: Conference Paper

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