Crystal growth of ZnS films by a charged aerosol-assisted vapor deposition process

Chemical Vapor Deposition

Volumn 12, Issue 10, 2006, Pages 631-636

  Hou, Xianghui ^a   Choy, Kwang Leong ^a  

^a UNIVERSITY OF NOTTINGHAM   (United Kingdom)

Author keywords

Aerosol assisted vapor deposition; Charged droplets; Electrostatic assisted aerosol jet deposition (EAAJD); Zinc sulfide (ZnS)

Indexed keywords

AEROSOLS; CHEMICAL VAPOR DEPOSITION; CRYSTAL GROWTH; CRYSTAL STRUCTURE; OPTOELECTRONIC DEVICES; ZINC SULFIDE;

AEROSOL ASSISTED VAPOR DEPOSITION; CHARGED DROPLETS; ELECTROSTATIC ASSISTED AEROSOL JET DEPOSITION (EAAJD); PRECURSOR DROPLETS;

THIN FILMS;

EID: 34047216146     PISSN: 09481907     EISSN: 15213862     Source Type: Journal    
DOI: 10.1002/cvde.200506403     Document Type: Article

References (24)

1. K. L. Choy, Prog. Mater. Sci. 2003, 48, 57.
2. K. L. Choy, in Innovative Processing of Films and Nanocrystalline Powders (Ed: K. L. Choy), Imperial College Press, London 2002, pp. 15-69.
3. K. L. Choy, Surf. Eng. 2000, 16, 449.
4. D. Michelson, Electrostatic Atomization, IOP Publishing Ltd., Bristol, UK 1990.
5. D. Grigoriev, K. L. Choy, Scr. Mater. 2004, 51, 857.
6. J. Lee, S. Lee, S. Cho, S. Kim, I. Y. Park, Y. D. Choi, Mater. Chem. Phys. 2002, 77, 254.
7. J. Vidal, O. Melo, O. Vigil, N. Lopez, G. Contreras-Puente, A. Zelaya, Thin Solid Films 2002, 419, 118.
8. C. Thiandoume, O. Ka, A. Lusson, O. Gorochov, J. Crysr. Growth 1999, 197, 805.
9. C. S. Chang, J. L. He, Z. P. Lin, Wear 2003, 255, 115
10. E. Y. M. Lee, N. H. Tran, J. J. Russell, R. N. Lamb, J. Phys. Chem. B 2004, 108, 8355.
11. E. Y. M. Lee, N. H. Tran, J. J. Russell, R. N. Lamb, J. Phys. Chem. B 2003, 107, 5208.
12. D. Barreca, E. Tondello, D Lydon, T. R. Spalding, M. Fabrizio, Chem. Vap. Deposition 2003, 9, 93
13. Y. Drezner, S. Berger, M. Hefetz, Mater. Sci. Eng. B 2001, 87, 59.
14. B. Su, K. L. Choy, J. Mater. Chem. 2000, 10, 949.
15. B. Su, K. L. Choy, Thin Solid Films 2000, 361-362, 102.
16. A. Gomez, K. Tang, Phys. Fluids 1994, 6, 404.
17. G. Shimaoka, G. Arakawa, Y. Suzuki, Appl. Surf. Sci. 2003, 212-213, 694.
18. N. H. Tran, R. N. Lamb, G. L. Mar, Coll. Surf. A 1999, 155, 93.
19. R. G. Zhang, B. Y. Wang, H. Zhang, L. Wei. Appl. Surf. Sci. 2005, 245, 240.
20. J. Gonzalez-Hernandez, P. M. Gorley, P. P. Horley, O. M. Vartsabyuk, Y. V. Vorobiev, Thin Solid Films 2002, 403-404, 471.
21. M. Ichimura, F. Goto, E. Arai, J. Appl. Phys. 1999, 85, 7411.
22. Y. Natsume, H. Sakata, J. Mater. Sci.: Mater. Electron. 2001, 12, 87.
23. M. Izaki, T. Omi, J. Electrochem. Soc. 1997, 144, L3.
24. M. Gamero-Castano, J. Fermandez de la Mora, J. Chem. Phys. 2000, 113, 815.