Single-source CVD of zinc sulfide-based thin films from zinc bis(O-ethylxanthate)

Chemical Vapor Deposition

Volumn 9, Issue 2, 2003, Pages 93-98

  Barreca, Davide ^a   Tondello, Eugenio ^a   Lydon, Donocadh ^b   Spalding, Trevor R ^b   Fabrizio, Monica ^a  

^a CNR   (Italy)

^b UNIVERSITY COLLEGE CORK   (Ireland)

Author keywords

Single source precursor; Surface techniques; ZnS

Indexed keywords

ATOMIC FORCE MICROSCOPY; AUGER ELECTRON SPECTROSCOPY; FILM GROWTH; INFRARED SPECTROSCOPY; LIGHT ABSORPTION; SECONDARY ION MASS SPECTROMETRY; SILICA; SUBSTRATES; THIN FILMS; ULTRAVIOLET RADIATION; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC COMPOUNDS; ZINC SULFIDE;

SINGLE-SOURCE PERCURSORS; SURFACE TECHNIQUES; X-RAY EXCITED AUGER ELECTRON SPECTROSCOPY (XE-AES); ZNS;

CHEMICAL VAPOR DEPOSITION;

EID: 2942639565     PISSN: 09481907     EISSN: None     Source Type: Journal    
DOI: 10.1002/cvde.200390008     Document Type: Article

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