Physical structures of SiO 2 ultrathin films probed by grazing incidence x-ray reflectivity

Journal of Applied Physics

Volumn 97, Issue 12, 2005, Pages

  Azuma, Yasushi ^a   Fan, Jiangwei ^b   Kojima, Isao ^b   Wei, Shiqiang ^a  

^a UNIVERSITY OF SCIENCE AND TECHNOLOGY OF CHINA   (China)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CARBONACEOUS COMPOUNDS; GRAZING INCIDENCE X-RAY REFLECTIVITY (GIXPR); INTERFACE ROUGHNESS; SI SUBSTRATES;

CARRIER CONCENTRATION; DENSITY (SPECIFIC GRAVITY); HIGH RESOLUTION ELECTRON MICROSCOPY; SEMICONDUCTING FILMS; SILICA; SURFACE ROUGHNESS; THICKNESS MEASUREMENT; X RAY ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

ULTRATHIN FILMS;

EID: 21644437028     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1941469     Document Type: Article

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