Nano-scale surface modification of materials with slow, highly charged ion beams

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 257, Issue 1-2 SPEC. ISS., 2007, Pages 297-300

  Sakurai, M ^a   Tona, M ^b   Takahashi, S ^b   Watanabe, H ^b   Nakamura, N ^b   Yoshiyasu, N ^b   Yamada, C ^b   Ohtani, S ^b   Sakaue, H A ^c   Kawase, Y ^a   Mitsumori, K ^a   Terui, T ^d   Mashiko, S ^d  

^a KOBE UNIVERSITY   (Japan)

^b UNIVERSITY OF ELECTRO COMMUNICATIONS   (Japan)

^c NATIONAL INSTITUTE FOR FUSION SCIENCE   (Japan)

^d NATIONAL INSTITUTE OF INFORMATION AND COMMUNICATIONS TECHNOLOGY   (Japan)

Author keywords

Electron beam ion source (EBIS); Highly charged ion (HCI); Scanning tunneling microscopy (STM)

Indexed keywords

GRAPHITE; ION BEAMS; METAL IONS; OPTICAL COLLIMATORS; SCANNING TUNNELING MICROSCOPY; SURFACE TREATMENT;

ELECTRON BEAM ION SOURCE (EBIS); HIGHLY CHARGED ION (HCI); PYROLYTIC GRAPHITE SURFACE;

NANOSTRUCTURED MATERIALS;

EID: 33947700260     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nimb.2007.01.060     Document Type: Article

References (11)

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