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Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5038 I, Issue , 2003, Pages 12-21

A new laboratory EUV reflectometer for large optics using a laser plasma source

(17) Van Loyen, Ludwig a Böttger, Thomas a Braun, Stefan a Mai, Hermann a Leson, Andreas a Scholze, Frank b Tümmler, Johannes b Ulm, Gerhard b Legall, Herbert c Nickles, Peter V c Sandner, Wolfgang c Stiel, Holger c Rempel, Christian d Schulze, Mirko e Brutscher, Jörg f Macco, Fritz g Müllender, Stephan g

a FRAUNHOFER INSTITUTE FOR MATERIAL AND BEAM TECHNOLOGY IWS (Germany)

b PHYSIKALISCH TECHNISCHE BUNDESANSTALT (Germany)

c MAX BORN INSTITUT (Germany)

d BESTEC GmbH (Germany)

e AIS Automation Dresden GmbH (Germany)

f Fa GBS Elektronik GmbH (Germany)

g CARL ZEISS SMT AG (Germany)

Author keywords

At wavelength characterization; Extreme ultraviolet; Lithography; Metrology; Reflectometry

Indexed keywords

GONIOMETERS; LASER PRODUCED PLASMAS; MASKS; MIRRORS; MONOCHROMATORS; OPTICS; REFLECTOMETERS; STORAGE RINGS; SYNCHROTRON RADIATION; ULTRAVIOLET RADIATION;

ELECTRON STORAGE RING; EXTREME ULTRAVIOLET REFLECTOMETER; LASER PLASMA SOURCE; REFLECTOMETRY; SOFT X RAY RADIOMETER;

OPTICAL VARIABLES MEASUREMENT;

EID: 0141835808 PISSN: 0277786X EISSN: None Source Type: Conference Proceeding
DOI: 10.1117/12.485042 Document Type: Conference Paper

Times cited : (32)

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