Surface morphology of LaNiO3 thin films and its dependence on annealing temperature

Transactions of the Institute of Metal Finishing

Volumn 85, Issue 2, 2007, Pages 107-110

  Dong, D ^a   Hu, W C ^a   Zhan, W L ^a   Liu, G J ^a  

^a UNIVERSITY OF ELECTRONIC SCIENCE AND TECHNOLOGY OF CHINA   (China)

Author keywords

LaNiO3 thin film; Leakage current; Sol gel method; Surface morphology

Indexed keywords

ANNEALING; CONDUCTIVE FILMS; HEAT TREATMENT; LANTHANUM COMPOUNDS; LEAKAGE CURRENTS; SHEET RESISTANCE; SOL-GEL PROCESS; SPIN COATING; SURFACE MORPHOLOGY;

AMBIENT ATMOSPHERE; CRYSTALLINITY; LNO FILMS;

THIN FILMS;

EID: 33947688234     PISSN: 00202967     EISSN: None     Source Type: Journal    
DOI: 10.1179/174591907X177552     Document Type: Article

References (17)

1. Ch. Wenger, M. Albert, B. Adolphi, H. Heuer, J. W. Bartha and F. Schlenkrich: Mater. Sci. Semicond. Proc. 2003, 5, 233-236.
2. D. S. Wu, R. H. Horng, C. C. Lin and Y. H. Liu: Microelectron. Eng., 2003, 66, 600-607.
3. H. P. Xu, H. Zhu, K. Hashimoto, T. Kiyomoto, T. Mukaigawa, R. Kubo, Y. Yoshino, M. Noda, Y. Suzuki and M. Okuyama: Vacuum., 2000, 59, 628-634.
4. L. Goux, M. Gervais, A. Catherinot, C. Champeaux and F. Sabary: J. Non-Cryst. Solids, 2002, 303, 194-200.
5. S. Thakoor: J. Appl. Phys., 1994, 75, 5409-5414.
6. S. S. Kim, T. S. Kang and J. H. Je: Thin Solid Films, 2002, 405, 117-121.
7. A. R. Zomorrodian, N. J. Wu, H. Liu, et al.: Thin Solid Films, 1998, 335, 225-228.
8. J. T. Cheng, P. E. D. Morgan, D. H. Lowndes, X.-Y. Zheng and J. Breen: Appl. Phys. Lett., 1993, 62, 2045-2048.
9. Q. X. Jia, H. H. Kung and X. D. Wu: Solid State Ionics, 2001, 138, 183-190.
10. S. Miyake, S. Fujihara and T. Kimura: J. Eur. Ceram. Soc., 2001, 21, 1525-1528.
11. N. Wakiya, T. Azuma, K. Shinozaki and N. Mizutani: Thin Solid Films, 2002, 410, 114-120.
12. A. D. Li, C. Z. Ge, D. Wu, P. Lv, Y.-Q. Zuo, S.-Z. Yang and N.-B. Ming: Thin Solid Films, 1997, 298, 165-169.
13. K. Ueno, W. Sakamoto, T. Yogo and S.-I. Hirano: Jpn J. Appl. Phys., 2000, 40, 6049-6054.
14. S. H. Yu, K. Yao and F. T. E. Hock: Ceram. Internat., 2004, 30, 1253-1256.
15. Y. Ling, W. Ren, X. Q. Wu, L. Y. Zhang and X. Yao: Thin Solid Films, 1997, 311, 128-132.
16. A. D. Li, D. Wu, Z. G. Liu, et al.: Thin Solid Films, 1998, 336, 386-390.
17. W. C. Hu, C. R. Yang, W. L. Zhang and Y. Qiu: J. Sol-gel Sci. Technol., 2005, 36, 249-255. Available at http://www.springerlink. com/content/y8554700437g0gt4/.