Influence of film thickness, substrate temperature and nano-structural changes on the optical properties of UHV deposited Ti thin films

Journal of Physics D: Applied Physics

Volumn 40, Issue 1, 2007, Pages 203-214

  Savaloni, Hadi ^a,b   Kangarloo, Haleh ^b  

^a UNIVERSITY OF TEHRAN   (Iran)

^b ISLAMIC AZAD UNIVERSITY   (Iran)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION; FILM THICKNESS; OPTICAL PROPERTIES; SPECTROPHOTOMETRY; THERMAL EFFECTS; TITANIUM; TRANSFER MATRIX METHOD; ULTRAHIGH VACUUM; VOLUME FRACTION;

EFFECTIVE MEDIUM APPROXIMATION (EMA) ANALYSIS; OPTICAL FUNCTIONS; STRUCTURE ZONE MODEL (SZM); TITANIUM FILMS;

THIN FILMS;

EID: 33947624217     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/40/1/016     Document Type: Conference Paper

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