X-ray scattering study of thin films of poly(2,5-bis(3-alkylthiophen-2-yl) thieno[3,2-b]thiophene)

Journal of the American Chemical Society

Volumn 129, Issue 11, 2007, Pages 3226-3237

  Chabinyc, Michael L ^a   Toney, Michael F ^b   Kline, R Joseph ^c   McCulloch, Iain ^d   Heeney, Martin ^d  

^a PALO ALTO RESEARCH CENTER   (United States)

^b SLAC NATIONAL ACCELERATOR LABORATORY   (United States)

^c NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^d Merck Chemicals   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; DIELECTRIC DEVICES; SILICA; SPIN COATING; THIN FILM TRANSISTORS; X RAY DIFFRACTION;

ELECTRICAL TRANSPORT; HIGH FIELD EFFECT MOBILITY; POLYMER CHAINS; SILICON DIOXIDE DIELECTRICS;

SEMICONDUCTING POLYMERS;

ALKYL GROUP; POLYMER; SILANE DERIVATIVE; SILICON DIOXIDE; THIOPHENE DERIVATIVE;

ARTICLE; ATOMIC FORCE MICROSCOPY; CRYSTALLIZATION; DIELECTRIC CONSTANT; FILM; RADIATION SCATTERING; SURFACE PROPERTY; SYNCHROTRON; X RAY DIFFRACTION;

MOTION PICTURES; POLYMERS; SEMICONDUCTORS; SILANES; SILICON DIOXIDE; THIOPHENES; X-RAY DIFFRACTION;

EID: 33947416524     PISSN: 00027863     EISSN: None     Source Type: Journal    
DOI: 10.1021/ja0670714     Document Type: Article

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