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Volumn 138, Issue 3, 2007, Pages 271-276
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Effect of tin doping on the properties of indium-tin-oxide films deposited by radio frequency magnetron sputtering
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Author keywords
Annealing; Indium tin oxide; Physical vapor deposition (PVD); Resistivity; Sputtering; Tin
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Indexed keywords
ANNEALING;
CARRIER CONCENTRATION;
CARRIER MOBILITY;
DOPING (ADDITIVES);
MAGNETRON SPUTTERING;
PHYSICAL VAPOR DEPOSITION;
THIN FILMS;
ANNEALING TEMPERATURE;
INDIUM-TIN-OXIDE;
OPTICAL BAND GAP;
TIN;
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EID: 33947386674
PISSN: 09215107
EISSN: None
Source Type: Journal
DOI: 10.1016/j.mseb.2007.01.025 Document Type: Article |
Times cited : (12)
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References (22)
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