Progress on PEEM3 - An aberration corrected X-ray photoemission electron microscope at the ALS

AIP Conference Proceedings

Volumn 879, Issue , 2007, Pages 1341-1344

  MacDowell, A A ^a   Feng, J ^a   Demello, A ^a   Doran, A ^a   Duarte, R ^a   Forest, E ^b   Kelez, N ^a   Marcus, M A ^a   Miller, T ^a   Padmore, H A ^a   Raoux, S ^c   Robin, D ^a   Scholl, A ^a   Schlueter, R ^a   Schmid, P ^a   Stohr J ^d   Wan, W ^a   Wei, D H ^e   Wu, Y ^f  

^a LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^b HIGH ENERGY ACCELERATOR RESEARCH ORGANIZATION KEK   (Japan)

^c IBM ALMADEN RESEARCH CENTER   (United States)

^d SLAC NATIONAL ACCELERATOR LABORATORY   (United States)

^e NATIONAL SYNCHROTRON RADIATION RESEARCH CENTER   (Taiwan)

^f DUKE UNIVERSITY   (United States)

Author keywords

Aberration correction; PEEM; Photoemission electron microscope

Indexed keywords

EID: 33947383754     PISSN: 0094243X     EISSN: 15517616     Source Type: Conference Proceeding    
DOI: 10.1063/1.2436312     Document Type: Conference Paper

References (13)

1. E.Brucher, Z. Phys., 86, 448- (1933).
2. S. Anders et al., Rev. Sci. Instrum, 70, 3973-3981(1999).
3. D.Preikszas and H.Rose, J.Electro. Microscopy, 1, 1-9 (1997).
4. T.Warwick et al., "A New VLS grating monochromator beamline with energy stabilization" these proceedings.
5. R.N.Watts, et al., Rev.Sci.Instrum., 68, 3464-3476 (1997).
6. H.Rose and D.Preikszas, Optik, 92, 31-44 (1992).
7. W. Wan, J. Feng and H.A. Padmore , "A new separator design for aberration corrected photoemission electron microscopes ", Nucl. Instr. and Meth. A in press.
8. W.Wan, et al., Nucl.Instr. Meths., A519, 222-229(2004).
9. R.Fink et.al., J.Elec.Spec Rel Phenom., 84, 231-250 (1997).
10. Y.K.Wu et al., Nucl.Instr. Meths, A519, 230-241 (2004).
11. G.F.Rempfer et al., Ultramicroscopy, 36, 196-221 (1991).
12. J.Feng, et al., J.Phys: 17, S1339-S1350(2005).
13. Ibex Engineering, Newbury Park, CA, 91320, USA