Submicron optical near-field diffraction patterns obtained by irradiation of octadecyltrimethoxysilane self-assembled monolayers with light at 157 nm

Thin Solid Films

Volumn 515, Issue 12, 2007, Pages 5147-5152

  Nae, F A ^a   Saito, N ^a   Takai, O ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

Diffraction patterns; Fluorine laser; Proximity lithography; Self assembled monolayers

Indexed keywords

DECOMPOSITION; IRRADIATION; PHOTOMASKS; SELF ASSEMBLED MONOLAYERS; SILANES; SUBSTRATES;

FLUORINE LASERS; FRESNEL DIFFRACTION; PHOTOCHEMICAL DECOMPOSITION; PROXIMITY LITHOGRAPHY;

DIFFRACTION PATTERNS;

EID: 33947181339     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.10.090     Document Type: Article

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