High-volume full-wafer step-and-flash imprint lithography

Solid State Technology

Volumn 50, Issue 2, 2007, Pages 39-43

  Resnick, Douglas J ^a   Schmid, Gerard ^a   Miller, Mike ^a   Doyle, Gary ^a   Jones, Chris ^a   LaBrake, Dwayne ^a  

^a MOLECULAR IMPRINTS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

IMPRINT LITHOGRAPHY; IMPRINTING; ULTRAVIOLET (UV) CURABLE LIQUIDS; WIRE GRID POLARIZERS;

DROPS; ELECTRIC WIRE; PHOTONIC CRYSTALS; SILICON WAFERS; SOLID STATE DEVICES;

LITHOGRAPHY;

EID: 33947163892     PISSN: 0038111X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article

References (15)

1. M. Colburn, S. Johnson, M. Stewart, S. Damle, T. Bailey, B. Choi, et al., Proc. SPIE, Emerging Lithographic Technologies III, 379, 1999.
2. T.C. Bailey, D.J. Resnick, D. Mancini, K.J. Nordquist, W.J. Dauksher, E. Ainley, et al., Microelectronic Engineering, Vol. 61-62, pp. 461-467, 2002.
3. W.J. Dauksher, K.J. Nordquist, D. Mancini, D.J. Resnick, J.H. Baker, A.E. Hooper, et al., J. Vac. Sci. Technol. B 20(6), pp. 2857-2861, 2002
4. J.J. Wierer, M.R. Krames, J.E. Epler, N.F. Gardner, J.R. Wendt, M.M. Sigalas, et al., Proc. SPIE, Vol. 5739, pp. 102-107, 2005.
5. F. Hua, Y. Sun, A. Gaur, M.A. Meitl, L. Bilhaut, L. Rotkina, et al., Nano Lett., 4(12), pp. 2467-2471, 2004.
6. G.M. Schmid, D.J. Resnick, E.D. Thompson, L.J. Myron, D.L. Olyhick, J.A. Liddle, et al., International Symposium on Electron, Ion, and Photon Beam Technology, and Nanobfabrication, June 2006.
7. M. Colburn, T. Bailey, B.J. Choi, J.G. Ekerdt, S.V. Sreenivasan, C.G. Willson, "Development and Advantages of Step-and-flash Lithography," Solid State Technology, 67, July 2001.
8. G.M. Schmid, E. Thompson, N. Stacey, D.J. Resnick, D.L. Olynick, E.H. Anderson, to be published in Microelectronic Engineering, 2007.
9. W. Hu, K. Sarveswaran, M. Lieberman, G.H. Bernstein, J. Vac. Sci. Technol. B 22, 4, July/Aug. 2004.
10. H. Namatsu, T. Yamaguchi, M. Nagase, K. Yamazaki, K. Kurihara, Microelectronic Engineering, 41/42, pp. 331-334, 1998.
11. E.E. Moon, P.N. Everett, H.I. Smith, to be published in J. Vac. Sci. Technol. B, Nov./Dec., 2006.
12. E.E. Moon, M.K. Mondol, P.N. Everett, H.I. Smith, J. Vac. Sci. Technol. B, 23, 749, 2005.
13. M. Miller, G. Schmid, G. Doyle, E. Thompson, D.J. Resnick, to be published in Microelectronic Engineering, 2007.
14. M. Miller, G. Doyle, N. Stacey, F. Xu, S.V. Sreenivasan, M. Watts, et al., Proc. SPIE 5751, 994, 2005.
15. S.V. Sreenivasan, I. McMackin, F. Xu, D. Wang, N. Stacey, D. Resnick, "Using Reverse-tone Bilayer Etch in Ultraviolet Nanoimprint Lithography," Micro Magazine, Jan./Feb. 2005.