Fabrication of nanometer sized features on non-flat substrates using a nano-imprint lithography process

Progress in Biomedical Optics and Imaging - Proceedings of SPIE

Volumn 5751, Issue II, 2005, Pages 994-1002

  Miller, Mike ^a   Doyle, Gary ^a   Stacey, Nick ^a   Xu, Frank ^a   Sreenivasan, S V ^a   Watts, Mike ^a   LaBrake, Dwayne L ^a  

^a MOLECULAR IMPRINTS INC   (United States)

Author keywords

Imprint Lithography; Nano Lithography; Nanoimprint Lithography; Step and Flash Imprint Lithography

Indexed keywords

IMPRINT LITHOGRAPHY; NANO LITHOGRAPHY; NANOIMPRINT LITHOGRAPHY; STEP AND FLASH IMPRINT LITHOGRAPHY;

FABRICATION; NANOTECHNOLOGY; SUBSTRATES; TOPOLOGY; VISCOSITY;

LITHOGRAPHY;

EID: 24644470954     PISSN: 16057422     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.607340     Document Type: Conference Paper

References (5)

1. Colburn, M., Johnson, S., Stewart, M., Damle, S., Bailey, T., Choi, B.J., Wedlake, M., Michaelson, T., Sreenivasan, S.V., Ekerdt, J., and Willson, C.G., "Step and Flash Imprint Lithography: A New Approach to High-Resolution Patterning". Proceedings of the SPIE's 24th International Symposium on Microlithography: Emerging Lithographic Technologies III, Santa Clara, CA, Vol. 3676, Part One, pp. 379-389, March 1999.
2. David P. Mancini, Kathleen A. Gehoski, William J. Dauksher, Kevin J. Nordquist, Douglas J. Resnick, Philip Schumaker, and lan McMackin, "Analysis of Critical Dimension Uniformity for step and flash imprint lithography", SPIE Microlithography Conference, February 2003.
3. M. Colburn, A. Grot, M. Amistoso, B. J. Choi, T. Bailey, J. Ekerdt, S.V. Sreenivasan, J. Hollenhorst, C. G. Willson, "Step and Flash Imprint Lithography for sub-100nm Patterning", 2000 SPIE's 25th Intl. Symp. Microlithography: Emerging Lithographic Technologies III. Feb. 28 - Mar. 3, 2000 Santa Clara, CA.
4. Frank Xu, Nick Stacey, Mike Watts, Van Truskett, lan McMackin, Jin Choi, Philip Schumaker, Ecron Thompson, Daniel Babbs, SV Sreenivasan, Grant Willson, Norm Schumaker, "Development of Imprint Materials for the Step and Flash Imprint Lithography Process" SPIE Microlithography Conference. February 2004.
5. "Wafer Nanotopology ", MEMC Application Note AE-008, August 2001.