MD simulations of amorphous SiO2 thin film formation in reactive sputtering deposition processes

Thin Solid Films

Volumn 515, Issue 12, 2007, Pages 4879-4882

  Taguchi, Masafumi ^a,b   Hamaguchi, Satoshi ^a  

^a OSAKA UNIVERSITY   (Japan)

^b NIPPON SHEET GLASS CO LTD   (Japan)

Author keywords

Deposition; Molecular Dynamics; Monte Carlo method; SiO2

Indexed keywords

COMPUTER SIMULATION; HEAT RESISTANCE; MOLECULAR DYNAMICS; MONTE CARLO METHODS; SILICA; SPUTTER DEPOSITION;

CLASSICAL MOLECULAR DYNAMICS; NUMERICAL SIMULATIONS; THIN FILM DEPOSITION;

THIN FILMS;

EID: 33947136254     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.10.097     Document Type: Article

References (15)

1. M. Taguchi, T. Kunisada, S. Kusaka, S. Hamaguchi, IEEE Trans. Plasma Sci. (in press).
2. Serikov V.V. J. Appl. Phys. 82 (1997) 5948
3. Macleod H.A. Thin-Film Optical Filters. 2nd ed. (1986), McGraw-Hill, New York
4. Takahashi H. Appl. Opt. 34 (1995) 667
5. Brown J.T. Appl. Opt. 43 (2004) 4506
6. Mao D., Tao K., and Hopwood J. J. Vac. Sci. Technol., A, Vac. Surf. Films 20 (2001) 379
7. Prins S.L., Barron A.C., Herrmann W.C., and McNeil J.R. Appl. Opt. 43 (2004) 626
8. Maznev A.A. J. Appl. Phys. 90 (2001) 4392
9. von Popta A.C., Hawkeye M.M., Sit J.C., and Brett M.J. Opt. Lett. 29 (2004) 2545
10. Stillinger F.H., and Weber T.A. Phys. Rev., B 31 (1985) 5262
11. Watanabe T., Fujiwara H., Noguchi H., Hosino T., and Ohdomari I. Jpn. J. Appl. Phys. 38 (1999) L366
12. Ohta H., and Hamaguchi S. J. Chem. Phys. 115 (2001) 6679
13. Ohta H., and Hamaguchi S. Jpn. J. Appl. Phys. 19 (2001) 2373
14. Yamada H., and Hamaguchi S. J. Appl. Phys. 96 (2004) 6147
15. Satake K., and Graves D.B. J. Chem. Phys. 118 (2003) 6503