Detailed study of the plasma-activated catalytic generation of ammonia in N2-H2 plasmas

Journal of Applied Physics

Volumn 101, Issue 4, 2007, Pages

  Van Helden, J H ^a   Wagemans, W ^a   Yagci, G ^a   Zijlmans, R A B ^a   Schram, D C ^a   Engeln, R ^a   Lombardi, G ^b,c   Stancu, G D ^b   Ropcke J ^b  

^a EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

^b Institut für Niedertemperatur Plasmaphysik Greifswald   (Germany)

^c UNIVERSITÉ PARIS 13   (France)

Author keywords

[No Author keywords available]

Indexed keywords

CATALYST ACTIVITY; FLUXES; HYDROGEN; NITROGEN; PASSIVATION; PLASMAS;

HABER BOSCH PROCESSES; PRECURSOR MOLECULES; WALL MATERIAL;

AMMONIA;

EID: 33847677612     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2645828     Document Type: Article

References (55)

1. K. Tamaru, in Catalytic Ammonia Synthesis, edited by, J. Jennings, (Plenum, New York, 1991), p. 1.
2. V. Smil, Nature (London) 400, 415 (1999).
3. M. D. Fryzuk, Nature (London) 427, 498 (2004).
4. S. R. Tennison, in Catalytic Ammonia Synthesis, edited by, J. Jennings, (Plenum, New York, 1991), p. 303.
5. K. Aika, Angew. Chem., Int. Ed. Engl. 25, 558 (1986).
6. G. Ertl, in Catalytic Ammonia Synthesis, edited by, J. Jennings, (Plenum, New York, 1991), p. 109.
7. C. Zhang, Z. -P. Liu, and P. Hu, J. Chem. Phys. 0021-9606 10.1063/1.1384008 115, 609 (2001).
8. O. Nomura, H. Oyama, and Y. Sakamoto, Sci. Pap. Inst. Phys. Chem. Res. (Jpn.) 75, 124 (1981).
9. E. N. Eremin, A. N. Mal'tsev, and V. M. Belova, Russ. J. Phys. Chem. 45, 635 (1971).
10. M. Tanaka, H. Uyama, and O. Matsumoto, Plasma Chem. Plasma Process. 14, 491 (1994).
11. K. S. Yin and M. Venugopalan, Plasma Chem. Plasma Process. 0272-4324 10.1007/BF00564632 3, 343 (1983).
12. H. Kiyooka and O. Matsumoto, Plasma Chem. Plasma Process. 16, 547 (1996).
13. M. Touvelle, J. L. M. Licea, and M. Venugopalan, Plasma Chem. Plasma Process. 7, 101 (1987).
14. H. Uyama and O. Matsumoto, Plasma Chem. Plasma Process. 0272-4324 10.1007/BF01015824 9, 13 (1989).
15. B. Gordiets, C. M. Ferreira, M. J. Pinheiro, and A. Ricard, Plasma Sources Sci. Technol. 0963-0252 10.1088/0963-0252/7/3/015 7, 363 (1998).
16. B. Gordiets, C. M. Ferreira, M. J. Pinheiro, and A. Ricard, Plasma Sources Sci. Technol. 0963-0252 10.1088/0963-0252/7/3/016 7, 379 (1998).
17. A. Ricard, B. F. Gordiets, M. J. Pinheiro, C. M. Ferreira, G. Baravian, J. Amorim, S. Bockel, and H. Michel, Eur. Phys. J.: Appl. Phys. 1286-0042 10.1051/epjap:1998246 4, 87 (1998).
18. J. L. Jauberteau, I. Jauberteau, and J. Aubreton, J. Phys. D 0022-3727 10.1088/0022-3727/35/7/315 35, 665 (2002).
19. W. M. M. Kessels, F. J. H. van Assche, J. Hong, D. C. Schram, and M. C. M. van de Sanden, J. Vac. Sci. Technol. A 0734-2101 10.1116/1.1631294 22, 96 (2004).
20. H. Kim, J. Vac. Sci. Technol. B 1071-1023 10.1116/1.1622676 21, 2231 (2003).
21. H. Nagai, M. Hiramatsu, M. Hori, and T. Goto, J. Appl. Phys. 0021-8979 10.1063/1.1588351 94, 1362 (2003).
22. P. Vankan, T. Rutten, S. Mazouffre, D. C. Schram, and R. Engeln, Appl. Phys. Lett. 0003-6951 10.1063/1.1494104 81, 418 (2002).
23. M. C. M. van de Sanden, R. J. Severens, W. M. M. Kessels, R. F. G. Meulenbroeks, and D. C. Schram, J. Appl. Phys. 0021-8979 10.1063/1.368977 84, 2426 (1998); M. C. M. van de Sanden, R. J. Severens, W. M. M. Kessels, R. F. G. Meulenbroeks, and D. C. Schram, J. Appl. Phys. 85, 1243 (E) (1999).
24. M. C. M. van de Sanden, R. J. Severens, W. M. M. Kessels, R. F. G. Meulenbroeks, and D. C. Schram, J. Appl. Phys. 0021-8979 10.1063/1.368977 84, 2426 (1998); M. C. M. van de Sanden, R. J. Severens, W. M. M. Kessels, R. F. G. Meulenbroeks, and D. C. Schram, J. Appl. Phys. 85, 1243 (E) (1999).
25. P. Vankan, S. Mazouffre, R. Engeln, and D. C. Schram, Phys. Plasmas 1070-664X 10.1063/1.2076507 12, 102303 (2005).
26. R. Engeln, S. Mazouffre, P. Vankan, D. C. Schram, and N. Sadeghi, Plasma Sources Sci. Technol. 0963-0252 10.1088/0963-0252/10/4/308 10, 595 (2001).
27. S. Mazouffre, I. Bakker, P. Vankan, R. Engeln, and D. C. Schram, Plasma Sources Sci. Technol. 0963-0252 10.1088/0963-0252/11/4/311 11, 439 (2002).
28. M. C. M. van de Sanden, J. M. de Regt, G. M. Jansen, J. A. M. van der Mullen, D. C. Schram, and B. van der Sijde, Rev. Sci. Instrum. 0034-6748 10.1063/1.1142554 63, 3369 (1992).
29. R. P. Dahiya, M. J. de Graaf, R. J. Severens, H. Swelsen, M. C. M. van de Sanden, and D. C. Schram, Phys. Plasmas 1070-664X 10.1063/1.870604 1, 2086 (1994).
30. CHEMKIN interface 4, distributed by Reaction Design (available online at www.ReactionDesign.com).
31. M. Capitelli, C. M. Ferreira, B. F. Gordiets, and A. I. Osipov, Plasma Kinetics in Atmospheric Gases (Springer, Berlin, 2000).
32. H. van Eck (private communication).
33. J. Röpcke, L. Mechold, M. Kaning, J. Anders, F. G. Wienhold, D. Nelson, and M. Zahniser, Rev. Sci. Instrum. 0034-6748 10.1063/1.1290041 71, 3706 (2000).
34. L. S. Rothman, A. Barbe, D. C. Benner, L. R. Brown, C. Camy-Peyret, M. R. Carleer, K. Chance, C. Clerbaux, V. Dana, V. M. Devi, J. Quant. Spectrosc. Radiat. Transf. 0022-4073 10.1016/S0022-4073(03)00146-8 82, 5 (2003).
35. R. Engeln, G. Berden, R. Peeters, and G. Meijer, Rev. Sci. Instrum. 0034-6748 10.1063/1.1149176 69, 3763 (1998).
36. G. Berden, R. Peeters, and G. Meijer, Chem. Phys. Lett. 0009-2614 10.1016/S0009-2614(99)00504-7 307, 131 (1999).
37. R. Peeters, G. Berden, A. Apituley, and G. Meijer, Appl. Phys. B: Lasers Opt. 71, 231 (2000).
38. L. Lundsberg-Nielsen, F. Hegelund, and F. M. Nicolaisen, J. Mol. Spectrosc. 0022-2852 10.1006/jmsp.1993.1280 162, 230 (1993).
39. A. J. M. Buuron, D. K. Otorbaev, M. C. M. van de Sanden, and D. C. Schram, Phys. Rev. E 1063-651X 10.1103/PhysRevE.50.1383 50, 1383 (1994).
40. G. J. H. Brussaard, Ph.D. thesis, Eindhoven University of Technology, Eindhoven (1999); available online at http://alexandria.tue.nl/extra2/9900312. pdf.
41. R. F. G. Meulenbroeks, A. J. van Beek, A. J. G. van Helvoort, M. C. M. van de Sanden, and D. C. Schram, Phys. Rev. E 1063-651X 10.1103/PhysRevE.49.4397 49, 4397 (1994).
42. J. Peterson, A. L. Padellec, H. Danared, G. Dunn, M. Larsson, A. Larson, R. Peverall, C. Strömholm, S. Rośn, M. af Ugglas, J. Chem. Phys. 0021-9606 10.1063/1.475577 108, 1978 (1998).
43. M. A. Blauw, Internal Report, Eindhoven University of Technology (2004).
44. P. Vankan, R. Engeln, and D. C. Schram, Appl. Phys. Lett. 0003-6951 10.1063/1.1879112 86, 101501 (2005).
45. B. Jackson and M. Pearson, J. Chem. Phys. 0021-9606 10.1063/1.462034 96, 2378 (1992).
46. C. T. Rettner, Phys. Rev. Lett. 0031-9007 10.1103/PhysRevLett.69.383 69, 383 (1992).
47. G. G. Mannella, Chem. Rev. (Washington, D.C.) 63, 1 (1963).
48. J. -P. Sarrette, B. Rouffet, and A. Ricard, Plasma Processes Polym. 3, 120 (2006).
49. J. Amorim, G. Baravian, and G. Sultan, Appl. Phys. Lett. 0003-6951 10.1063/1.116293 68, 1915 (1996).
50. B. Gordiets, C. M. Ferreira, J. Nahorny, D. Pagnon, M. Touzeau, and M. Vialle, J. Phys. D 29, 1021 (1996).
51. A. Gelb and S. K. Kim, J. Chem. Phys. 0021-9606 10.1063/1.1675602 55, 4935 (1971).
52. C. J. Hagedorn, M. J. Weiss, and W. H. Weinberg, J. Vac. Sci. Technol. A 0734-2101 10.1116/1.581282 16, 984 (1998).
53. Z. -P. Liu, P. Hu, and M. -H. Lee, J. Chem. Phys. 0021-9606 10.1063/1.1602054 119, 6282 (2003).
54. H. Shi, K. Jacobi, and G. Ertl, J. Chem. Phys. 0021-9606 10.1063/1.468930 102, 1432 (1995).
55. R. M. van Hardeveld, R. A. van Santen, and J. W. Niemantsverdriet, J. Vac. Sci. Technol. A 0734-2101 10.1116/1.580631 15, 1558 (1997).