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Volumn 2005, Issue , 2005, Pages 330-333

MEMS hotplates with TiN as a heater material

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; ELECTRON SCATTERING; MICROELECTROMECHANICAL DEVICES; SPUTTERING; STRESS ANALYSIS; TEMPERATURE MEASUREMENT;

EID: 33847273683     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ICSENS.2005.1597703     Document Type: Conference Paper
Times cited : (13)

References (16)
  • 4
    • 0033326121 scopus 로고    scopus 로고
    • The fabrication and reliability testing of Ti/TiN heaters
    • Santa Clara, California, Sept
    • P. de Moor, A. Witvrouw, V. Simons, and I. de Wolf, "The fabrication and reliability testing of Ti/TiN heaters", Proc. SPIE, Santa Clara, California, Sept. 1999, Vol. 3874 (1999) 284-293.
    • (1999) Proc. SPIE , vol.3874 , pp. 284-293
    • de Moor, P.1    Witvrouw, A.2    Simons, V.3    de Wolf, I.4
  • 6
    • 0042007365 scopus 로고
    • Growth and properties of radio frequency reactively sputtered titanium nitride thin films
    • N. Kumar, P. Pourrezaei, M. Fissel, T. Begley, B. Lee, and E.C. Douglas, "Growth and properties of radio frequency reactively sputtered titanium nitride thin films", J. Vac. Sci. Technol. A 5 (1987) 1778-1782.
    • (1987) J. Vac. Sci. Technol. A , vol.5 , pp. 1778-1782
    • Kumar, N.1    Pourrezaei, P.2    Fissel, M.3    Begley, T.4    Lee, B.5    Douglas, E.C.6
  • 7
    • 0031275891 scopus 로고    scopus 로고
    • Thermal modelling and characterisation of micropower chemoresistive silicon sensors
    • A. Pike and J. W. Gardner, "Thermal modelling and characterisation of micropower chemoresistive silicon sensors", Sens. Actuat. B 45 (1997) 19-26.
    • (1997) Sens. Actuat. B , vol.45 , pp. 19-26
    • Pike, A.1    Gardner, J.W.2
  • 9
    • 33645168076 scopus 로고    scopus 로고
    • Silicon-based microreactors for high-temperature heterogeneous partial oxidation reactions
    • Ph.D. thesis, University of Twente, Enschede, The Netherlands
    • R.M. Tiggelaar, "Silicon-based microreactors for high-temperature heterogeneous partial oxidation reactions", Ph.D. thesis, University of Twente, Enschede, The Netherlands, 2004.
    • (2004)
    • Tiggelaar, R.M.1
  • 11
    • 0019589557 scopus 로고
    • Effects of argon pressure and substrate temperature on the structure and properties of sputtered copper films
    • S. Craig and G.L. Harding, "Effects of argon pressure and substrate temperature on the structure and properties of sputtered copper films", J. Vac. Sci. Technol. 19 (1981) 205-215.
    • (1981) J. Vac. Sci. Technol , vol.19 , pp. 205-215
    • Craig, S.1    Harding, G.L.2
  • 12
    • 78650224871 scopus 로고
    • Properties and microelectronic applications of thin films of refractory metal nitrides
    • M. Wittmer, "Properties and microelectronic applications of thin films of refractory metal nitrides", J. Vac. Sci. Technol. A 3 (1985) 1797-1803.
    • (1985) J. Vac. Sci. Technol. A , vol.3 , pp. 1797-1803
    • Wittmer, M.1
  • 13
    • 0021155115 scopus 로고
    • Influence of the nitrogen partial pressure on the properties of D.C.-sputtered titanium and titanium nitride
    • G. Lemperière and J.M. Poitevin, "Influence of the nitrogen partial pressure on the properties of D.C.-sputtered titanium and titanium nitride", Thin Solid Films 111 (1984) 339-349.
    • (1984) Thin Solid Films , vol.111 , pp. 339-349
    • Lemperière, G.1    Poitevin, J.M.2
  • 14
    • 0022080421 scopus 로고
    • Structure and properties of TiN coatings
    • J.-E. Sundgren, "Structure and properties of TiN coatings", Thin Solid Films 128 (1985) 21-44.
    • (1985) Thin Solid Films , vol.128 , pp. 21-44
    • Sundgren, J.-E.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.