Magnetic hexapole lens focusing of a metastable helium atomic beam for UV-free lithography

Applied Physics B: Lasers and Optics

Volumn 86, Issue 3, 2007, Pages 491-496

  Chaustowski, R R ^a   Leung, V Y F ^a,b   Baldwin, K G H ^a  

^a AUSTRALIAN NATIONAL UNIVERSITY   (Australia)

^b INSTITUT FÜR ANGEWANDTE PHYSIK   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC BEAMS; EXCITONS; FOCUSING; HELIUM; MAGNETIC LENSES; ULTRAVIOLET RADIATION;

GAS ATOMS; HELIUM ATOMIC BEAM; MAGNETIC HEXAPOLE LENS; METASTABLE HELIUM ATOMS;

ION BEAM LITHOGRAPHY;

EID: 33847209276     PISSN: 09462171     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00340-006-2497-2     Document Type: Article

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