Effects of temperature and atmosphere on the epitaxial growth of hematite (α-Fe2O3) films on the R-, A- and C-planes of sapphire (α-Al2O3) by coating-pyrolysis process

Thin Solid Films

Volumn 365, Issue 1, 2000, Pages 36-42

  Yamaguchi, I ^a   Manabe, T ^a   Kumagai, T ^a   Kondo, W ^a   Mizuta, S ^a  

^a NATL INST OF MAT AND CHEM RES   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; EPITAXIAL GROWTH; IRON OXIDES; PARTIAL PRESSURE; PRESSURE EFFECTS; PYROLYSIS; SAPPHIRE; SUBSTRATES; X RAY CRYSTALLOGRAPHY;

FULL WIDTH AT HALF MAXIMUM (FWHM); HEMATITE; POLE FIGURE ANALYSIS;

THIN FILMS;

EID: 0033872556     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)00651-9     Document Type: Article

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