Nanocrystalline Cr2O3-TiO2 thin films by pulsed laser deposition

Sensors and Actuators, B: Chemical

Volumn 109, Issue 1, 2005, Pages 24-31

  Jantson, T ^a   Avarmaa, T ^a   Mandar H ^a   Uustare, T ^a   Jaaniso, R ^a  

^a UNIVERSITY OF TARTU   (Estonia)

Author keywords

Cr2O3; Gas sensors; Nanostructural thin films; Pulsed laser deposition; TiO 2

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; CHEMICAL SENSORS; CHROMIUM COMPOUNDS; CRYSTALLIZATION; FILM GROWTH; NANOSTRUCTURED MATERIALS; PULSED LASER DEPOSITION; REFLECTION HIGH ENERGY ELECTRON DIFFRACTION; X RAY DIFFRACTION ANALYSIS;

CR2O3; CRYSTALLINITY; NANOSTRUCTURAL THIN FILMS; TIO2;

THIN FILMS;

EID: 22944456818     PISSN: 09254005     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.snb.2005.03.014     Document Type: Article

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