Atmospheric pressure chemical vapor deposition of TiSi2 films on glass

Zhenkong Kexue yu Jishu Xuebao/Journal of Vacuum Science and Technology

Volumn 25, Issue SUPPL., 2005, Pages 68-71

  Du, Jun ^a,b   Du, Piyi ^a   Han, Gaorong ^a   Weng, Wenjian ^a   Wang, Jianxun ^a  

^a ZHEJIANG UNIVERSITY   (China)

^b NANCHANG UNIVERSITY   (China)

Author keywords

Chemical vapor deposition; Film; Titanium disilicide

Indexed keywords

ATMOSPHERIC PRESSURE; CHEMICAL VAPOR DEPOSITION; ELECTRIC RESISTANCE; GLASS; MICROSTRUCTURE; SILICON; TITANIUM;

GLASS SUBSTRATE; ORTHORHOMBIC STRUCTURE; SHEET RESISTANCE; SUBSTRATE TEMPERATURE; TITANIUM DISILICIDE;

THIN FILMS;

EID: 33646870362     PISSN: 16727126     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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