Reduction of the C49→C54 phase transformation temperature in co-sputtered TiSi2 thin films by ternary alloying

Intermetallics

Volumn 11, Issue 5, 2003, Pages 417-424

  Hashimoto, Takashi ^a   Inui, Haruyuki ^a   Tanaka, Katsushi ^a   Yamaguchi, Masaharu ^a  

^a KYOTO UNIVERSITY   (Japan)

Author keywords

A. Titanium silicides; B. Electrical resistance and other electrical properties; B. Phase transformation; D. Microstructure

Indexed keywords

ALLOYING; CHEMICAL MODIFICATION; ELECTRIC RESISTANCE; GOLD; MICROSTRUCTURE; MOLYBDENUM; NIOBIUM; PHASE TRANSITIONS; SPUTTERING; TERNARY SYSTEMS; THIN FILMS;

RELATIVE STABILITY;

TITANIUM ALLOYS;

EID: 0037402155     PISSN: 09669795     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0966-9795(03)00022-0     Document Type: Article

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