Generation of high-power arbitrary-wave-form modulated inductively coupled plasmas for materials processing

Applied Physics Letters

Volumn 90, Issue 7, 2007, Pages

  Tanaka, Yasunori ^a   Morishita, Yu ^a   Fushie, Shunsuke ^a   Okunaga, Kyota ^a   Uesugi, Yoshihiko ^a  

^a KANAZAWA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; ELECTRIC CURRENTS; FREE RADICALS; PULSE AMPLITUDE MODULATION; THERMAL EFFECTS; WAVEFORM ANALYSIS;

ARBITRARY-WAVE-FORM MODULATED INDUCTION THERMAL PLASMA (AMITP); HIGH-DENSITY PLASMAS; MATERIALS PROCESSING;

INDUCTIVELY COUPLED PLASMA;

EID: 33847095934     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2696885     Document Type: Article

References (15)

1. L. Tong and R. G. Reddy, Mater. Res. Bull. 41, 2303 (2006).
2. J. E. Lee, S. M. Oh, and D. W. Park, Thin Solid Films 457, 230 (2004).
3. T. Ishigaki, S. M. Oh, J. G. Ji, and D. W. Park, Sci. Technol. Adv. Mater. 6, 111 (2005).
4. M. Shigeta, T. Watanabe, and H. Nishiyama, Thin Solid Films 457, 192 (2004).
5. J. O. Berghaus, J.-L. Meunier, and F. Gitzhofer, Meas. Sci. Technol. 15, 161 (2004).
6. H. Huang, K. Eguchi, and T. Yoshida, Sci. Technol. Adv. Mater. 4, 617 (2003).
7. T. Ishigaki, F. Xiaobao, T. Sakuta, T. Banjo, and Y. Shibuya, Appl. Phys. Lett. 71, 3787 (1997).
8. T. Sakuta, Y. Tanaka, Y. Hashimoto, and M. Katsuki, Electr. Eng. Jpn. 138, 26 (2002).
9. T. Sakuta, Y. Tanaka, K. C. Paul, M. M. Hossain, and T. Ishigaki, Trans. Mater. Res. Soc. Jpn. 25, 35 (2000).
10. Y. Tanaka and T. Sakuta, Trans. Mater. Res. Soc. Jpn. 25, 293 (2000).
11. Y. Tanaka and T. Sakuta, Plasma Sources Sci. Technol. 12, 69 (2003).
12. Y. Tanaka, J. Phys. D 39, 307 (2006).
13. N. Ohashi, T. Ishigaki, N. Okada, T. Sekiguchi, I. Sakaguchi, and H. Haneda, Appl. Phys. Lett. 80, 2869 (2002).
14. N. Ohashi, T. Ishigaki, N. Okada, H. Taguchi, I. Sakaguchi, S. Hishita, T. Sekiguchi, and H. Haneda, J. Appl. Phys. 93, 6386 (2003).
15. Y. Tanaka, T. Muroya, K. Hayashi, and Y. Uesugi, Appl. Phys. Lett. 89, 031501 (2006).