Time-dependent two-temperature chemically non-equilibrium modelling of high-power Ar-N2 pulse-modulated inductively coupled plasmas at atmospheric pressure

Journal of Physics D: Applied Physics

Volumn 39, Issue 2, 2006, Pages 307-319

  Tanaka, Yasunori ^a  

^a KANAZAWA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ATMOSPHERIC PRESSURE; CHEMICAL ANALYSIS; DIFFUSION; ENTHALPY; ITERATIVE METHODS; PULSE MODULATION;

GAS FLOW; HIGH-POWER DENSITY PLASMAS; PLASMA TEMPERATURE; RADICAL DENSITIES;

INDUCTIVELY COUPLED PLASMA;

EID: 32644451694     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/39/2/011     Document Type: Article

References (37)

1. Benmansour M, Nikravech M, Morvan D, Amouroux J and Chapelle J 2004 Diagnostic by emission spectroscopy of an argon-hydrogen RF inductive thermal plasma for purification of metallurgical grade silicon J. Phys. D: Appl. Phys. 37 2966-74
2. Benocci R, Esena P, Galassi A, Piselli M and Sciascia M 2004 Study of thermal plasma etching at atmospheric pressure on silica rods J. Phys. D: Appl. Phys. 37 1206-13
3. Han P and Yoshida T 2002 Growth and transport of clusters in thermal plasma vapor deposition of silicon J. Appl. Phys. 92 4772-8
4. Liao F, Park S, Larson J M, Zachariah M R and Girshick S L 2003 High-rate chemical vapor deposition of nanocrystalline silicon carbide films by radio frequency thermal plasma Mater. Lett. 57 1982-6
5. Ishigaki T, Seung-Min Oh, Ji-Guang Li and Dong-Wha Park 2005 Controlling the synthesis of TaC nanopowders by injecting liquid precursor into RF induction plasma Sci. Technol. Adv. Mater. 6 111-8
6. Watanabe T and Okumiya H 2004 Formation mechanism of silicide nanoparticles by induction thermal plasmas Sci. Technol. Adv. Mater. 5 639-46
7. Son S, Taheri M, Carpenter E, Harris V G and McHenry M E 2002 Synthesis of ferrite and nickel ferrite nanoparticles using radio-frequency thermal plasma torch J. Appl. Phys. 91 7589-91
8. Tanaka Y and Sakuta T 2002 Investigation on plasma-quenching efficiency of various gases using the inductively coupled thermal plasma technique: effect of various gas injection on Ar thermal ICP J. Phys. D: Appl. Phys. 35 2149-58
9. Bourg F, Pellerin S, Morvan D, Amouroux J and and Chapelle J 2002 Spectroscopic diagnostic of an argon-hydrogen RF inductive thermal plasma torch at atmospheric pressure used for silicon hydrogenation J. Phys. D: Appl. Phys. 35 2281-90
10. Wang C, Inazaki A, Shirai T, Tanaka Y, Sakuta T, Takikawa H and Matsuo H 2003 Effect of ambient gas and pressure on fullerene synthesis in induction thermal plasma Thin Solid Films 425 42-9
11. Boulos M I, Fauchais P and Pfender E 1994 Thermal Plasmas Fundamentals and Applications vol I (New York: Plenum) pp 33-43
12. Ishigaki T, Xiaobao F, Sakuta T, Banjo T and Shibuya Y 1997 Generation of pulse-modulated induction thermal plasma at atmospheric pressure Appl. Phys. Lett. 71 3787-9
13. Sakuta T and Ishigaki T 1999 Non-equilibrium effects in pulse modulated induction thermal plasmas for advanced material processing Pure Appl. Chem. 71 1845-52
14. Tanaka Y and Sakuta T 2000 Measurement of dynamic response time in pulse-modulated induction thermal plasma Trans. MRS-J 25 293-6
15. Tanaka Y and Sakuta T 2003 Temperature control of Ar induction thermal plasma with diatomic molecular gases by pulse-amplitude modulation of coil-current Plasma Sources Sci. Technol. 12 69-77
16. Hossain M M, Tanaka Y and Sakuta T 2003 Extinguishing phenomenon and critical discharge boundaries of argon and molecular gas-seeded argon pulse modulated induction thermal plasmas Plasma Sources Sci. Technol. 12 22-9
17. 2 induction thermal plasmas in pulse modulation approach: a numerical analysis Thin Solid Films 435 19-26
18. Mostaghimi J, Proulx P and Boulos M I 1987 A two-temperature model of the inductively coupled rf plasma J. Appl. Phys. 61 1753-60
19. Paik S H and Pfender E 1990 Modeling of an inductively coupled plasma at reduced pressures Plasma Chem. Plasma Process. 10 167-88
20. Zhao G Y, Mostaghimi J and Boulos M I 1990 The induction plasma chemical reactor: Part II. Kinetic model Plasma Chem. Plasma Process. 10 151-66
21. Watanabe T, Kanzawa A, Ishigaki T and Moriyoshi Y 1993 Numerical simulations of argon-hydrogen rf thermal plasmas with additional gas injection Proc. 6th Symp. Plasma Sci. Mater. (Tokyo) 211-8
22. 2 induction thermal plasma with reactor chamber Joint Int. Plasma Symp. of 6th APCPST, 15th SPSM, OS2002 and 11th KAPRA (Jeju, Korea) no 204
23. 2 thermal ICP at atmospheric pressure using reaction kinetics J. Phys. D: Appl. Phys. 35 468-76
24. 2 induction thermal plasma after step current disturbance Proc. 24th Int. Conf. on Gas Discharges and their Applications (Liverpool, UK) vol 2 pp 44-7
25. 2 inductively coupled plasmas at atmospheric pressure J. Phys. D: Appl. Phys. 37 1190-205
26. Dunn M G and Lordi K A 1970 Measurement of dissociative recombination in expanding nitrogen flows AIAA J. 8 339-45
27. Owano T G, Kruger C H and Beddini 1993 Electron-ion three-body recombination coefficient of argon AIAA J. 31 75-82
28. 2 and argon ions and neutrals in Ar for energies from 0.1 eV to 10 keV J. Phys. Chem. Ref. Data 20 557-73
29. Yos J M 1963 Transport properties of nitrogen, hydrogen, oxygen and air to 30 000 K Technical Memorandum RAD-TM-63-7 AVCO Corporation
30. Hirschfelder J O, Curtiss C F and Bird R B 1964 Molecular Theory of Gases and Liquids (New York: Wiley)
31. Murphy A B 2001 Thermal plasmas in gas mixtures J. Phys. D: Appl. Phys. 34 R151-73
32. Murphy A B 2000 Treatments of diffusion in thermal plasmas High Temp. Mater. Process. 4 1-20
33. Ramshaw J D and Chang C H 1991 Ambipolar diffusion in multicomponent plasmas Plasma Chem. Plasma Process. 11 395-402
34. Boulos M I, Fauchais P and Pfender E 1994 Thermal Plasmas Fundamentals and Applications vol I (New York: Plenum) pp 140-4
35. Devoto R S 1967 Transport coefficients of partially ionized argon Phys. Fluid 10 354-64
36. Devoto R S 1967 Simplified expressions for the transport properties of ionized monatomic gases Phys. Fluid 10 2105-12
37. Patankar S V 1980 Numerical Heat Transfer and Fluid Flow (New York: Hemisphere)