Monitoring and control of RF thermal plasma diamond deposition via substrate biasing

Measurement Science and Technology

Volumn 15, Issue 1, 2004, Pages 161-164

  Berghaus, Jörg Oberste ^a   Meunier, Jean Luc ^a   Gitzhofer, François ^b  

^a MCGILL UNIVERSITY   (Canada)

^b UNIVERSITÉ DE SHERBROOKE   (Canada)

Author keywords

Bias assisted TP CVD; Diamond films; Inductively coupled plasma (ICP); Thermal plasma chemical vapour deposition (TP CVD)

Indexed keywords

CRYSTAL GROWTH; DIAMOND FILMS; ELECTRIC POTENTIAL; ELECTRON EMISSION; NUCLEATION;

ELECTRICAL PROBES;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

VAPOR DEPOSITION;

EID: 0742304788     PISSN: 09570233     EISSN: None     Source Type: Journal    
DOI: 10.1088/0957-0233/15/1/023     Document Type: Article

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