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Volumn 12, Issue 1, 2003, Pages 69-77

Temperature control of Ar induction thermal plasma with diatomic molecular gases by pulse amplitude modulation of the coil current

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; ATMOSPHERIC PRESSURE; ELECTRIC COILS; ELECTRIC CURRENTS; MOLECULAR PHYSICS; MOSFET DEVICES; PULSE AMPLITUDE MODULATION; TEMPERATURE CONTROL; TEMPERATURE MEASUREMENT;

EID: 0037292706     PISSN: 09630252     EISSN: None     Source Type: Journal    
DOI: 10.1088/0963-0252/12/1/309     Document Type: Article
Times cited : (32)

References (28)
  • 1
    • 0032186932 scopus 로고    scopus 로고
    • Photovoltaic silicon produced by thermal plasma: Influence of atomic hydrogen on oxygen elimination and passivation of the crystal defects
    • Morvan D, Carzard-Juvernat I and Amouroux J 1998 Photovoltaic silicon produced by thermal plasma: influence of atomic hydrogen on oxygen elimination and passivation of the crystal defects J. Mater. Res. 13 2709-20
    • (1998) J. Mater. Res. , vol.13 , pp. 2709-2720
    • Morvan, D.1    Carzard-Juvernat, I.2    Amouroux, J.3
  • 3
    • 0026257080 scopus 로고
    • An integrated fabrication process for solid oxide fuel cells using hybrid plasma spraying
    • (in Japanese)
    • Hamatani H, Kumaoka H, Yahata T and Yoshida T 1991 An integrated fabrication process for solid oxide fuel cells using hybrid plasma spraying J. Japan Inst. Metals 55 1240-8 (in Japanese)
    • (1991) J. Japan Inst. Metals , vol.55 , pp. 1240-1248
    • Hamatani, H.1    Kumaoka, H.2    Yahata, T.3    Yoshida, T.4
  • 5
    • 0028392834 scopus 로고
    • Mixing study of the induction plasma reactor: Part I. Axial injection mode
    • Soucy G, Jurewicz J W and Boulos M I 1994 Mixing study of the induction plasma reactor: Part I. Axial injection mode Plasma Chem. Plasma Process. 14 43-58
    • (1994) Plasma Chem. Plasma Process. , vol.14 , pp. 43-58
    • Soucy, G.1    Jurewicz, J.W.2    Boulos, M.I.3
  • 6
    • 0028392833 scopus 로고
    • Mixing study of the induction plasma reactor: Part II. Radial injection mode
    • Soucy G, Jurewicz J W and Boulos M I 1994 Mixing study of the induction plasma reactor: Part II. Radial injection mode Plasma Chem. Plasma Process. 14 59-71
    • (1994) Plasma Chem. Plasma Process. , vol.14 , pp. 59-71
    • Soucy, G.1    Jurewicz, J.W.2    Boulos, M.I.3
  • 7
    • 0027611045 scopus 로고
    • Fluid boundary layer effects in atmospheric-pressure plasma diamond film deposition
    • Girshick S L, Li, C, Yu B W and Han H 1993 Fluid boundary layer effects in atmospheric-pressure plasma diamond film deposition Plasma Chem. Plasma Process. 13 169-87
    • (1993) Plasma Chem. Plasma Process. , vol.13 , pp. 169-187
    • Girshick, S.L.1    Li, C.2    Yu, B.W.3    Han, H.4
  • 8
    • 0000195541 scopus 로고    scopus 로고
    • Particle and heat transport in a low-frequency inductively coupled plasma
    • Tuszewski M 1998 Particle and heat transport in a low-frequency inductively coupled plasma Phys. Plasmas 5 1198-205
    • (1998) Phys. Plasmas , vol.5 , pp. 1198-1205
    • Tuszewski, M.1
  • 9
    • 0023298450 scopus 로고
    • Heating of powders in an r.f. inductively coupled plasma under dense loading conditions
    • Proulx P, Mostaghimi J and Boulos M I 1987 Heating of powders in an r.f. inductively coupled plasma under dense loading conditions Plasma Chem. Plasma Process. 7 29-52
    • (1987) Plasma Chem. Plasma Process. , vol.7 , pp. 29-52
    • Proulx, P.1    Mostaghimi, J.2    Boulos, M.I.3
  • 11
    • 36549100827 scopus 로고
    • The effect of coil design on materials synthesis in an inductively coupled plasma torch
    • McKelliget J W and El-Kaddah N 1988 The effect of coil design on materials synthesis in an inductively coupled plasma torch J. Appl. Phys. 64 2948-54
    • (1988) J. Appl. Phys. , vol.64 , pp. 2948-2954
    • McKelliget, J.W.1    El-Kaddah, N.2
  • 12
    • 34249971031 scopus 로고
    • Two-dimensional electromagnetic field effects in induction plasma modelling
    • Mostaghini J and Boulos M I 1989 Two-dimensional electromagnetic field effects in induction plasma modelling Plasma Chem. Plasma Process. 9 25-44
    • (1989) Plasma Chem. Plasma Process. , vol.9 , pp. 25-44
    • Mostaghini, J.1    Boulos, M.I.2
  • 13
    • 0026116823 scopus 로고
    • Modeling of rf plasma torch with a metallic tube inserted for reactant injection
    • Chen X and Pfender E 1991 Modeling of rf plasma torch with a metallic tube inserted for reactant injection Plasma Chem. Plasma Process. 11 103-28
    • (1991) Plasma Chem. Plasma Process. , vol.11 , pp. 103-128
    • Chen, X.1    Pfender, E.2
  • 14
    • 0028428117 scopus 로고
    • Turbulence in induction plasma modelling
    • Chen K and Boulos M I 1994 Turbulence in induction plasma modelling J. Phys. D: Appl. Phys. 27 946-52
    • (1994) J. Phys. D: Appl. Phys. , vol.27 , pp. 946-952
    • Chen, K.1    Boulos, M.I.2
  • 16
    • 0001835477 scopus 로고
    • Effects of plasma diameter and operating frequency on dynamic behavior of induction thermal plasma
    • Sakuta T, Oguri S, Takashima T and Boulos M I 1993 Effects of plasma diameter and operating frequency on dynamic behavior of induction thermal plasma Plasma Sources Sci. Technol. 2 67-71
    • (1993) Plasma Sources Sci. Technol. , vol.2 , pp. 67-71
    • Sakuta, T.1    Oguri, S.2    Takashima, T.3    Boulos, M.I.4
  • 17
    • 0000803646 scopus 로고    scopus 로고
    • Generation of pulse-modulated induction thermal plasma at atmospheric pressure
    • Ishigaki T, Xiaobao F, Sakuta T, Banjo T and Shibuya Y 1997 Generation of pulse-modulated induction thermal plasma at atmospheric pressure Appl. Phys. Lett. 71 3787-9
    • (1997) Appl. Phys. Lett. , vol.71 , pp. 3787-3789
    • Ishigaki, T.1    Xiaobao, F.2    Sakuta, T.3    Banjo, T.4    Shibuya, Y.5
  • 18
    • 0000254262 scopus 로고    scopus 로고
    • Experimentally diagnosed transient behavior of pulse modulated inductively coupled thermal plasma
    • Sakuta T, Paul K C, Katsuki K and Ishigaki T 1999 Experimentally diagnosed transient behavior of pulse modulated inductively coupled thermal plasma J. Appl. Phys. 85 1372-7
    • (1999) J. Appl. Phys. , vol.85 , pp. 1372-1377
    • Sakuta, T.1    Paul, K.C.2    Katsuki, K.3    Ishigaki, T.4
  • 19
    • 0034251434 scopus 로고    scopus 로고
    • Prediction of operating region of pulse-modulated radio frequency inductively coupled thermal plasma
    • Hossain M M, Paul K C, Tanaka Y, Sakuta T and Ishigaki T 2000 Prediction of operating region of pulse-modulated radio frequency inductively coupled thermal plasma J. Phys. D: Appl. Phys. 33 1843-53
    • (2000) J. Phys. D: Appl. Phys. , vol.33 , pp. 1843-1853
    • Hossain, M.M.1    Paul, K.C.2    Tanaka, Y.3    Sakuta, T.4    Ishigaki, T.5
  • 20
    • 0001537720 scopus 로고    scopus 로고
    • Pulse-modulated rf thermal plasma for advanced materials processing
    • Ishigaki T and Sakuta T 1999 Pulse-modulated rf thermal plasma for advanced materials processing J. Intell. Mater. System. Struct. 10 565-8
    • (1999) J. Intell. Mater. System. Struct. , vol.10 , pp. 565-568
    • Ishigaki, T.1    Sakuta, T.2
  • 21
    • 0035536202 scopus 로고    scopus 로고
    • Transient response of radio frequency inductively coupled plasma for pulse modulation
    • Paul K C, Mostaghimi J, Ishigaki T and Sakuta T 2001 Transient response of radio frequency inductively coupled plasma for pulse modulation Plasma Chem. Plasma Process. 21 371-400
    • (2001) Plasma Chem. Plasma Process. , vol.21 , pp. 371-400
    • Paul, K.C.1    Mostaghimi, J.2    Ishigaki, T.3    Sakuta, T.4


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.